Wafer Edge Exposure System
Product ID: 03
It helps to remove photo resist from the wafer periphery. It is also useful for Bumping process.
Main Products:
UV Cure, W.E.E., UV Lamp, Photo Polarizer, Aligner, Stepper for bumping & wafer level, Multi-component concentration, Measuring Instrument, Filter, CD-SEM for Wafer/Mask, EBLITHO for LED Industry, Quartz Heater (Bath & In-Line), Related Products, T/H Controller, Chiller, PEL Thermo, Clean Oven & Cl