Sputtering target for TFT-LCD
Flat Panel Display Planar Sputtering Target
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The advantages of TFT-LCD are less energy consumption, high brightness and low response time. TTMC provide high purity and quality of Al, Mo, Cu, Ti targets for TFT-LCD and AM-OLED industries. Meanwhile, we well manage the material resource and improve technology to ensure the product quality and meet customers’ requirement for large size TFT-LCD panel which lead TTMC to high market share of sputtering target industry.。
- Drive Electrode: Al (5N), Al alloy, Cr, Ti, Mo, Cu.
- Black Matrix: Cr
- Transparent Electrode: ITO (In2O3-SnO2)(In2O3-SnO2)
- Diffuser material: Mo, Cr
- Dielectric material: Al2O3 , SiO2
- Well management of high purity raw material resource and processing,fully in-house and quality control.
- High market share and stable supply for generation 1 to 10.5 TFT-LCD panel
- High strength special bonding metal.
- Planar and rotary sputtering target synchronized supply.
Glass substrate size and sputtering target
|Gen||Glass substrate size (mm)||Target size(mm)|
Thin film sputtering tube/ plate target, metal powder for 3D printing, acid and alkali-resistance alloy and titanium for cooking/ tableware. Sputtering target bonding, precious metal recycling, Vacuum hot pressing sintering, forging and analysis